• Epitaxy

    • ATC-EP3 MBE System
      • Growth Chamber (8 K-Cells, RHEED)
      • Load Lock Chamber
    • UHV SPM-Based Nanolithography System
      • MBE Growth Chamber (6 K-Cells, RHEED)
      • Analysis Chamber (UPS and Auger)
      • Processing Chamber (ebeam, ECR, CVD, 2 K-Cells)
      • In-Situ SPM Chamber (Omicron LS-STM/AFM)

  • Processing

    • Class 100/1000 Clean Room Facility
    • Raith e-Beam Lithography System
    • Karl Suss Double Side Mask Aligner
    • Samco Load Locked Plasma Etcher
    • RF Plasma Ferroelectric Sputtering System
    • Sol-Gel Processing System
    • Thermal Evaporator System for Metal Deposition
    • e-Beam Metal Deposition System
    • RTA System
    • K&S Wire Bonder and Wafer Scriber

  • Optical

    • Photoluminescence System including Mira 900 Ti: Sapphire/OPO
    • Photo-Reflectance System
    • Electro-Reflectance System
    • Surface Photovoltage System
    • Optical Beam Induced Current System

  • Electrical

    • Hall Effect System
    • IV System
    • Variable Frequency CV (10kHz - 10 MHz)
    • Radiant Ferroelectric Test System
    • DLTS System
    • Oxford Kelvinox Dilution Fridge Magneto-Transport System

  • Computation

    • DCG, DEC, SUN, SGI and NCD Workstations
    • Linux Cluster
    • Access to scinet, sharcnet