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- Epitaxy
- ATC-EP3 MBE System
- Growth Chamber (8 K-Cells, RHEED)
- Load Lock Chamber
- UHV SPM-Based Nanolithography System
- MBE Growth Chamber (6 K-Cells, RHEED)
- Analysis Chamber (UPS and Auger)
- Processing Chamber (ebeam, ECR, CVD, 2 K-Cells)
- In-Situ SPM Chamber (Omicron LS-STM/AFM)
- Processing
- Class 100/1000 Clean Room Facility
- Raith e-Beam Lithography System
- Karl Suss Double Side Mask Aligner
- Samco Load Locked Plasma Etcher
- RF Plasma Ferroelectric Sputtering System
- Sol-Gel Processing System
- Thermal Evaporator System for Metal Deposition
- e-Beam Metal Deposition System
- RTA System
- K&S Wire Bonder and Wafer Scriber
- Optical
- Photoluminescence System including Mira 900 Ti: Sapphire/OPO
- Photo-Reflectance System
- Electro-Reflectance System
- Surface Photovoltage System
- Optical Beam Induced Current System
- Electrical
- Hall Effect System
- IV System
- Variable Frequency CV (10kHz - 10 MHz)
- Radiant Ferroelectric Test System
- DLTS System
- Oxford Kelvinox Dilution Fridge Magneto-Transport System
- Computation
- DCG, DEC, SUN, SGI and NCD Workstations
- Linux Cluster
- Access to scinet, sharcnet
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